Argon plasma decomposition of porogen in mesoporous silica films studied by positron annihilation

Chunqing He, Kenji Ito, Toshitaka Oka, Yoshinori Kobayashi, Toshiyuki Ohdaira, Ryoichi Suzuki

研究成果: Conference contribution

抄録

Mesoporous silica films on Si wafers were prepared via a sol-gel process using a triblock copolymer as the structural template. Spin-coated films were dried and subsequently subjected to Ar plasma treatments for decomposing the polymeric porogen. Mesopore formation in the silica film upon Ar plasma treatments was investigated by positron annihilation lifetime spectroscopy. In comparison with calcined silica film, much larger pores, more heterogeneous in size were found in silica film prepared with Ar plasma decomposition of the porogen.

本文言語English
ホスト出版物のタイトルPositron and Positronium Chemistry X
出版社Trans Tech Publications Ltd
ページ193-196
ページ数4
ISBN(印刷版)9783037855188
DOI
出版ステータスPublished - 2013
イベント10th International Workshop on Positron and Positronium Chemistry, PPC-10 - Smolenice Castle, Slovakia
継続期間: 2011 9月 52011 9月 9

出版物シリーズ

名前Materials Science Forum
733
ISSN(印刷版)0255-5476
ISSN(電子版)1662-9752

Other

Other10th International Workshop on Positron and Positronium Chemistry, PPC-10
国/地域Slovakia
CitySmolenice Castle
Period11/9/511/9/9

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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