Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering

Yoshiyasu Ito, Katsuhiko Inaba, Kazuhiko Omote, Yasuo Wada, Susumu Ikeda

研究成果: ジャーナルへの寄稿学術論文査読

15 被引用数 (Scopus)

抄録

A grazing incidence ultra-small-angle X-ray scattering measurement system using a laboratory X-ray source has been developed. Submicron-scale artificial periodic grooves on thermally oxidized silicon wafers are characterized using this system. They are fabricated by electron beam lithography. The average pitch widths of the grooves are determined accurately with a low standard uncertainty of less than 0.02%. The cross-sectional profiles are also analyzed by intensity ratios of higher-order diffraction peaks from the periodic structures and X-ray reflectivity measurements. The obtained cross-sectional profiles are in good agreement with those obtained by atomic force microscopy.

本文言語英語
ページ(範囲)L773-L775
ジャーナルJapanese Journal of Applied Physics
46
29-32
DOI
出版ステータス出版済み - 2007 8月 10

フィンガープリント

「Characterization of submicron-scale periodic grooves by grazing incidence ultra-small-angle X-ray scattering」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル