Crystal phase-selective epitaxy of rutile and anatase Nb-doped TiO 2 films on a GaN template by the helicon-wave-excited-plasma sputtering epitaxy method
Kouji Hazu, Aly Fouda, Tokuyuki Nakayama, Akikazu Tanaka, Shigefusa F. Chichibu
研究成果: Article › 査読
12
被引用数
(Scopus)