Damage-free ultradiluted HF/nitrogen jet spray cleaning for particle removal with minimal silicon and oxide loss

Material Science

• Silicon 100%
• Particle 50%
• Oxide 33%
• Silicon Dioxide 33%
• Silicon Wafer 16%
• Surface 16%

Engineering

• Cleaning 50%
• Cleaning Procedure 33%
• Losses 33%
• Minimization 16%
• Polysilicon 16%
• Silicon Wafer 16%
• Device Structure 16%
• Liquid Gas 16%
• Nitrogen Flow Rate 16%
• Surfaces 16%