Development of compact coherent EUV source based on laser Compton scattering

S. Kashiwagi, R. Kato, G. Isoyama, K. Sakaue, A. Masuda, T. Nomoto, T. Gowa, M. Washio, R. Kuroda, J. Urakawa

研究成果: ジャーナルへの寄稿学術論文査読

4 被引用数 (Scopus)

抄録

High-power extreme ultra-violet (EUV) sources are required for next generation semiconductor lithography. We start to develop a compact EUV source in the spectral range 13-14 nm, which is based on a laser Compton scattering between a 7 MeV micro-bucnhed electron beam and a high-intensity CO2 laser pulse. The electron beam extracted from a DC photocathode gun is micro-bunched using a laser modulation techinque with the Compton wavelength at a harmonic of the seeding laser before the main laser Compton scattering for EUV generation. A considerating scheme for the compact EUV source based on the laser Compton scattering with micro-bunched electron beam and the analytical study of micro-bunch generation are described in this paper.

本文言語英語
ページ(範囲)1112-1115
ページ数4
ジャーナルRadiation Physics and Chemistry
78
12
DOI
出版ステータス出版済み - 2009 12月

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