@inproceedings{3d7f25a5094d4032adcfee9c569591cd,
title = "Development of massive parallel electron beam write system",
abstract = "Prototype of Massively Parallel Electron Beam Write (MPEBW) system was developed for mask less lithography. A 100×100 array of nanocrystalline-silicon (nc-Si) electron emitter is controlled by an active matrix driving LSI. The LSI receives external writing bitmap data, and switches 100×100 electron beamlets on/off. The operation of the LSI was confirmed and 1/100 reduction electron optic system using the active matrix emitter array was fabricated. A 17×17 nc-Si emitter array was assembled with a 1:1 exposure test system and driven by commercially available display driver LSIs. The active matrix electron beam (EB) exposure was confirmed.",
keywords = "Electron beam, active matrix LSI, electron emitter array",
author = "Masayoshi Esashi and Hiroshi Miyaguchi and Akira Kojima and Naokatsu Ikegami and Nobuyoshi Koshida and Masanori Sugata and Hideyuki Ohyi",
note = "Publisher Copyright: {\textcopyright} 2019 SPIE. Downloading of the abstract is permitted for personal use only.; 26th Symposium on Photomask and Next-Generation Lithography Mask Technology, Photomask Japan 2019 ; Conference date: 16-04-2019 Through 18-04-2019",
year = "2019",
doi = "10.1117/12.2532971",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Akihiko Ando",
booktitle = "Photomask Japan 2019",
}