TY - GEN
T1 - Electrochemical properties of Fe2O3-Cr 2O3 thin films and pitting behavior of Fe-Cr alloys in neutral NaCl solutions
AU - Sugimoto, Katsuhisa
AU - Ohya, Yoshiyuki
AU - Akao, Noboru
AU - Hara, Nobuyoshi
PY - 2006/7/20
Y1 - 2006/7/20
N2 - Fe2O3-Cr2O3 thin films with various chromium cationic fractions, XCr, were prepared by ion-beam sputter deposition. The thinning rate of the films in 0-1M Cl -containing solutions with pH 0.2 - 8.0 was measured in-situ by using an automatic ellipsometer. The pitting behavior of vacuum induction melted Fe-Cr alloys with 10-30% Cr was also measured in IM Cl -containing solutions with pH 0.2 - 5.9. The composition of passive films on the alloys was analyzed by AES. Pit initiation sites were observed by SEM and analyzed by EPMA. The results showed pitting on the Fe-20Cr alloy in IM NaCl starts at Cr2O3 inclusions partly covered by sulfide. It is presumed that the XCr value of repassivation film formed inside a pit determines the repassivation of the pit through the suppression or no suppression of the reductive dissolution of the film.
AB - Fe2O3-Cr2O3 thin films with various chromium cationic fractions, XCr, were prepared by ion-beam sputter deposition. The thinning rate of the films in 0-1M Cl -containing solutions with pH 0.2 - 8.0 was measured in-situ by using an automatic ellipsometer. The pitting behavior of vacuum induction melted Fe-Cr alloys with 10-30% Cr was also measured in IM Cl -containing solutions with pH 0.2 - 5.9. The composition of passive films on the alloys was analyzed by AES. Pit initiation sites were observed by SEM and analyzed by EPMA. The results showed pitting on the Fe-20Cr alloy in IM NaCl starts at Cr2O3 inclusions partly covered by sulfide. It is presumed that the XCr value of repassivation film formed inside a pit determines the repassivation of the pit through the suppression or no suppression of the reductive dissolution of the film.
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M3 - Conference contribution
AN - SCOPUS:33745968771
SN - 1566774748
SN - 9781566774741
T3 - Proceedings - Electrochemical Society
SP - 194
EP - 204
BT - Pits and Pores III
T2 - 206th Electrochemical Society Meeting
Y2 - 3 October 2004 through 8 October 2004
ER -