High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems

K. Kobayashi; M. Yabashi; Y. Takata; T. Tokushima; S. Shin; K. Tamasaku; D. Miwa; T. Ishikawa; H. Nohira; T. Hattori; Y. Sugita; O. Nakatsuka; A. Sakai; S. Zaima

doi:10.1063/1.1595714

High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems

K. Kobayashi, M. Yabashi, Y. Takata, T. Tokushima, S. Shin, K. Tamasaku, D. Miwa, T. Ishikawa, H. Nohira, T. Hattori, Y. Sugita, O. Nakatsuka, A. Sakai, S. Zaima

研究成果: Article › 査読

342 被引用数 (Scopus)

抄録

High-resolution X-ray photoelectron spectroscopy at 6 keV photon energy was realized by utilizing high-flux-density x rays from the third-generation high-energy synchrotron radiation facility, SPring-8. The method was applied to high-k HfO₂/interlayer/Si complementary metal oxide superconductor gate-dielectric structures. Results indicated that SiO_xN_y as an interlayer was more effective in controlling the interface structure than SiO₂.

本文言語	English
ページ（範囲）	1005-1007
ページ数	3
ジャーナル	Applied Physics Letters
巻	83
号	5
DOI	https://doi.org/10.1063/1.1595714
出版ステータス	Published - 2003 8月 4
外部発表	はい

ASJC Scopus subject areas

物理学および天文学（その他）

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10.1063/1.1595714

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引用スタイル

Kobayashi, K., Yabashi, M., Takata, Y., Tokushima, T., Shin, S., Tamasaku, K., Miwa, D., Ishikawa, T., Nohira, H., Hattori, T., Sugita, Y., Nakatsuka, O., Sakai, A., & Zaima, S. (2003). High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems. Applied Physics Letters, 83(5), 1005-1007. https://doi.org/10.1063/1.1595714

Kobayashi, K, Yabashi, M, Takata, Y, Tokushima, T, Shin, S, Tamasaku, K, Miwa, D, Ishikawa, T, Nohira, H, Hattori, T, Sugita, Y, Nakatsuka, O, Sakai, A & Zaima, S 2003, 'High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems', Applied Physics Letters, vol. 83, no. 5, pp. 1005-1007. https://doi.org/10.1063/1.1595714

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AU - Hattori, T.

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