Impact of improved mobility and low flicker noise MOS transistors using accumulation mode fully depleted silicon-on-insulator devices

Weitao Cheng, Akinobu Teramoto, Philippe Gaubert, Masaki Hirayama, Tadahiro Ohmi

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

Improved mobility and low flicker noise device characteristics of fully depleted silicon-on-insulator (FD-SOI) MOSFETs are focused in this paper, using normally off accumulation mode device structures. It is demonstrated that the current drivabilities of both accumulation mode FD-SOI. n-and p-MOSFETs are improved above 1.3 times compared with inversion mode MOSFETs. The effective mobilities of accumulation mode MOSFETs are improved because of the lower effective electric field at the same gate bias and the bulk current components. The flicker noise characteristics in both accumulation mode FD-SOI n- and p-MOSFETs are about 1 digit lower compared with the inversion mode MOSFETs and show the SOI layer doping concentration dependences.

本文言語English
ホスト出版物のタイトルICSICT-2006
ホスト出版物のサブタイトル2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
出版社IEEE Computer Society
ページ65-67
ページ数3
ISBN(印刷版)1424401615, 9781424401611
DOI
出版ステータスPublished - 2006
外部発表はい
イベントICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology - Shanghai, China
継続期間: 2006 10月 232006 10月 26

出版物シリーズ

名前ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings

Other

OtherICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology
国/地域China
CityShanghai
Period06/10/2306/10/26

ASJC Scopus subject areas

  • 電子工学および電気工学

フィンガープリント

「Impact of improved mobility and low flicker noise MOS transistors using accumulation mode fully depleted silicon-on-insulator devices」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル