TY - JOUR
T1 - Improvement of AI-polar AIN layer quality by three-stage flow-modulation metalorganic chemical vapor deposition
AU - Takeuchi, Misaichi
AU - Ooishi, Shin
AU - Ohtsuka, Takumi
AU - Maegawa, Tomohiro
AU - Koyama, Takahiro
AU - Chichibu, Shigefusa F.
AU - Aoyagi, Yoshinobu
N1 - Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
PY - 2008/2
Y1 - 2008/2
N2 - Improvement of AI-polar AIN layer quality was accomplished by three-stage flow-modulation metalorganic chemical vapor deposition (FM-MOCVD). In this method, the unit of the FM-MOCVD sequence was composed of three stages; Stage I for simultaneous source supply, Stage II for trimethylaluminum supply, and Stage III for ammonia supply, which were cyclically repeated. The AIN quality revealed by X-ray diffraction strongly depended on the time of Stage I. A growth model was proposed considering the surface coverage of the islands nucleated during Stage I. Exciton fine structures were eventually observed by low-temperature cathodoluminescence reflecting the tremendously improved crystalline quality.
AB - Improvement of AI-polar AIN layer quality was accomplished by three-stage flow-modulation metalorganic chemical vapor deposition (FM-MOCVD). In this method, the unit of the FM-MOCVD sequence was composed of three stages; Stage I for simultaneous source supply, Stage II for trimethylaluminum supply, and Stage III for ammonia supply, which were cyclically repeated. The AIN quality revealed by X-ray diffraction strongly depended on the time of Stage I. A growth model was proposed considering the surface coverage of the islands nucleated during Stage I. Exciton fine structures were eventually observed by low-temperature cathodoluminescence reflecting the tremendously improved crystalline quality.
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U2 - 10.1143/APEX.1.021102
DO - 10.1143/APEX.1.021102
M3 - Article
AN - SCOPUS:57049109353
SN - 1882-0778
VL - 1
JO - Applied Physics Express
JF - Applied Physics Express
IS - 2
M1 - 021102
ER -