TY - JOUR
T1 - Improvement of the quality factor of single crystal diamond mechanical resonators
AU - Liao, Meiyong
AU - Toda, Masaya
AU - Sang, Liwen
AU - Teraji, Tokuyuki
AU - Imura, Masataka
AU - Koide, Yasuo
N1 - Funding Information:
This work was partially supported by JSPS KAKENHI Grant Numbers 15H03999 and 15H03980 and Nanotechnology Platform projects sponsored by the Ministry of Education, Culture, Sports, Science and Technology, Japan (MEXT).
Publisher Copyright:
© 2017 The Japan Society of Applied Physics.
PY - 2017/2
Y1 - 2017/2
N2 - Single-crystal diamond (SCD) has the potential to boost microelectromechanical system (MEMS) with unprecedented performance in terms of its intrinsic mechanical, chemical, and electronic properties, especially in the applications under extreme conditions. On the basis of the analysis of the energy dissipation in diamond mechanical resonators, the authors report on the marked improvement of the quality factor of SCD-MEMS resonators. Ion implantation assisted lift-off technique (IAL) is utilized to fabricate the SCD resonators. The quality factor of the resonator fabricated from the ion-damaged SCD layer alone is as low as 100-300 owing to the bulk or surface defects. The growth of homoepitaxial layers on the ion-implanted SCD substrates significantly improves the quality factor by more than 100 times. Cantilevers made of SCD epilayers of different thicknesses are examined. It is found that the quality factor increases with increasing the epilayer thickness. The maximum quality factor of the SCD cantilevers fabricated by the IAL technique reaches 3.9 × 104. A bilayer model is proposed to describe the variation of the quality factor.
AB - Single-crystal diamond (SCD) has the potential to boost microelectromechanical system (MEMS) with unprecedented performance in terms of its intrinsic mechanical, chemical, and electronic properties, especially in the applications under extreme conditions. On the basis of the analysis of the energy dissipation in diamond mechanical resonators, the authors report on the marked improvement of the quality factor of SCD-MEMS resonators. Ion implantation assisted lift-off technique (IAL) is utilized to fabricate the SCD resonators. The quality factor of the resonator fabricated from the ion-damaged SCD layer alone is as low as 100-300 owing to the bulk or surface defects. The growth of homoepitaxial layers on the ion-implanted SCD substrates significantly improves the quality factor by more than 100 times. Cantilevers made of SCD epilayers of different thicknesses are examined. It is found that the quality factor increases with increasing the epilayer thickness. The maximum quality factor of the SCD cantilevers fabricated by the IAL technique reaches 3.9 × 104. A bilayer model is proposed to describe the variation of the quality factor.
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U2 - 10.7567/JJAP.56.024101
DO - 10.7567/JJAP.56.024101
M3 - Article
AN - SCOPUS:85011604972
SN - 0021-4922
VL - 56
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 2
M1 - 024101
ER -