TY - JOUR
T1 - In Situ observation of dislocation behavior in nanometer grains
AU - Wang, Lihua
AU - Han, Xiaodong
AU - Liu, Pan
AU - Yue, Yonghai
AU - Zhang, Ze
AU - Ma, En
N1 - Copyright:
Copyright 2010 Elsevier B.V., All rights reserved.
PY - 2010/9/20
Y1 - 2010/9/20
N2 - Using a newly developed nanoscale deformation device, atomic scale and time-resolved dislocation dynamics have been captured in situ under a transmission electron microscope during the deformation of a Pt ultrathin film with truly nanometer grains (diameter d<∼10nm). We demonstrate that dislocations are highly active even in such tiny grains. For the larger grains (d∼10nm), full dislocations dominate and their evolution sometimes leads to the formation, destruction, and reformation of Lomer locks. In smaller grains, partial dislocations generating stacking faults are prevalent.
AB - Using a newly developed nanoscale deformation device, atomic scale and time-resolved dislocation dynamics have been captured in situ under a transmission electron microscope during the deformation of a Pt ultrathin film with truly nanometer grains (diameter d<∼10nm). We demonstrate that dislocations are highly active even in such tiny grains. For the larger grains (d∼10nm), full dislocations dominate and their evolution sometimes leads to the formation, destruction, and reformation of Lomer locks. In smaller grains, partial dislocations generating stacking faults are prevalent.
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U2 - 10.1103/PhysRevLett.105.135501
DO - 10.1103/PhysRevLett.105.135501
M3 - Article
AN - SCOPUS:77957133739
SN - 0031-9007
VL - 105
JO - Physical Review Letters
JF - Physical Review Letters
IS - 13
M1 - 135501
ER -