抄録
Magnetic tunnel junctions of Co0.9Fe0.1/SrTiO3 (STO)/ La0.7Sr0.3MnO3 (LSMO) with a spin-valve structure having an antiferromagnetic MnIr layer have been fabricated by sputtering. Junction magnetoresistance (MR) behavior and its dependence on the bias voltage are examined for junctions with epitaxial STO barrier formed under different sputtering conditions. Spin dependent transport measurements show that these junctions exhibit spin-valve type MR loops with an inverse (positive) MR of the ratio of 14-22% at 4.2 K. The inverse MR observed is asymmetric with respect to the bias voltage direction. Stoichiometric STO barrier, as characterized by Rutherford backscattering (RBS) analysis, is found to result in very large asymmetric bias dependence, while the junctions with nonstoichiometric STO barrier exhibit the symmetric bias dependence. Our results suggest that the nonstoichiometry of STO barrier modifies the electronic structures of electrode/barrier interfaces, and thereby reducing the asymmetry of bias voltage dependence of junction MR.
本文言語 | English |
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ページ(範囲) | 29-34 |
ページ数 | 6 |
ジャーナル | Materials Research Society Symposium - Proceedings |
巻 | 690 |
出版ステータス | Published - 2002 1月 1 |
外部発表 | はい |
イベント | Spintronics - Boston, MA, United States 継続期間: 2001 11月 26 → 2001 11月 29 |
ASJC Scopus subject areas
- 材料科学(全般)
- 凝縮系物理学
- 材料力学
- 機械工学