Mesoscopic-scale and small strain field beneath SiO2/Si interface revealed by a multiple-wave X-ray diffraction phenomenon-depth of the strain field
Wataru Yashiro, Yoshitaka Yoda, Toshio Takahashi, Akinobu Teramoto, Takeo Hattori, Kazushi Miki
研究成果: ジャーナルへの寄稿 › 学術論文 › 査読