Microstructure and tribological properties of SiOx/DLC films grown by PECVD

Won Jae Yang; Tohru Sekino; Kwang Bo Shim; Koichi Niihara; Keun Ho Auh

doi:10.1016/j.surfcoat.2004.05.023

Microstructure and tribological properties of SiO_x/DLC films grown by PECVD

Won Jae Yang, Tohru Sekino, Kwang Bo Shim, Koichi Niihara, Keun Ho Auh

多元物質科学研究所

研究成果: Article › 査読

53 被引用数 (Scopus)

抄録

The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiO_x/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiO_x/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiO_x/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiO_x/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiO_x/DLC films deposited at different bias voltages was investigated.

本文言語	English
ページ（範囲）	128-135
ページ数	8
ジャーナル	Surface and Coatings Technology
巻	194
号	1
DOI	https://doi.org/10.1016/j.surfcoat.2004.05.023
出版ステータス	Published - 2005 4月 20

ASJC Scopus subject areas

化学 (全般)
凝縮系物理学
表面および界面
表面、皮膜および薄膜
材料化学

文献へのアクセス

10.1016/j.surfcoat.2004.05.023

他のファイルとリンク

引用スタイル

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title = "Microstructure and tribological properties of SiOx/DLC films grown by PECVD",

abstract = "The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.",

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author = "Yang, {Won Jae} and Tohru Sekino and Shim, {Kwang Bo} and Koichi Niihara and Auh, {Keun Ho}",

note = "Funding Information: This study was financially supported by the Korean Science and Engineering Foundation (KOSEF) through the Ceramic Processing Research Center (CPRC) and also by the Core University Program between Hanyang University, Korea and Osaka University, Japan. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.",

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AU - Auh, Keun Ho

N1 - Funding Information: This study was financially supported by the Korean Science and Engineering Foundation (KOSEF) through the Ceramic Processing Research Center (CPRC) and also by the Core University Program between Hanyang University, Korea and Osaka University, Japan. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.

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N2 - The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.

AB - The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.

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KW - Hardness

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