TY - JOUR
T1 - Oriented growth of sexithiophene induced by edge of metal electrodes
AU - Ikeda, Susumu
AU - Wada, Yasuo
AU - Saiki, Koichiro
PY - 2010/4
Y1 - 2010/4
N2 - Recently it has been shown that the "graphoepitaxy" of organic semiconductor α-sexithiophene (6T) occurs on artificial periodic grooves fabricated on thermally-oxidized Si substrates. In the present study, similarly oriented growth of 6T thin films was found around the edge of metal electrodes. Using this phenomenon to realize single crystalline organic transistors, substrates with short channel Au electrodes were fabricated by photolithography, and 6T films were grown on these substrates by molecular beam deposition. The {010} planes of 6T crystals tended to face the wall of the channel (electrode edge), probably due to the chemical affinity of Au for S atoms in 6T molecules. The transistor characteristics of the test device were measured, and the results suggested that this orientation control technique using the shape of electrodes would lead to improvements in device performance.
AB - Recently it has been shown that the "graphoepitaxy" of organic semiconductor α-sexithiophene (6T) occurs on artificial periodic grooves fabricated on thermally-oxidized Si substrates. In the present study, similarly oriented growth of 6T thin films was found around the edge of metal electrodes. Using this phenomenon to realize single crystalline organic transistors, substrates with short channel Au electrodes were fabricated by photolithography, and 6T films were grown on these substrates by molecular beam deposition. The {010} planes of 6T crystals tended to face the wall of the channel (electrode edge), probably due to the chemical affinity of Au for S atoms in 6T molecules. The transistor characteristics of the test device were measured, and the results suggested that this orientation control technique using the shape of electrodes would lead to improvements in device performance.
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U2 - 10.1143/JJAP.49.04DK19
DO - 10.1143/JJAP.49.04DK19
M3 - Article
AN - SCOPUS:77952732648
SN - 0021-4922
VL - 49
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 4 PART 2
M1 - 04DK19
ER -