Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing

Nguyen Van Toan; Masaya Toda; Takumi Hokama; Takahito Ono

doi:10.1109/MEMSYS.2017.7863639

Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing

Nguyen Van Toan, Masaya Toda, Takumi Hokama, Takahito Ono

工学研究科・機械機能創成専攻

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.

本文言語	English
ホスト出版物のタイトル	2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017
出版社	Institute of Electrical and Electronics Engineers Inc.
ページ	1232-1235
ページ数	4
ISBN（電子版）	9781509050789
DOI	https://doi.org/10.1109/MEMSYS.2017.7863639
出版ステータス	Published - 2017 2月 23
イベント	30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017 - Las Vegas, United States 継続期間: 2017 1月 22 → 2017 1月 26

出版物シリーズ

名前	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
巻	0
ISSN（印刷版）	1084-6999

Other

Other	30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017
国/地域	United States
City	Las Vegas
Period	17/1/22 → 17/1/26

ASJC Scopus subject areas

電子材料、光学材料、および磁性材料
凝縮系物理学
機械工学
電子工学および電気工学

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10.1109/MEMSYS.2017.7863639

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引用スタイル

Van Toan, N., Toda, M., Hokama, T., & Ono, T. (2017). Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. In 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017 (pp. 1232-1235). [7863639] (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS); Vol. 0). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/MEMSYS.2017.7863639

Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. / Van Toan, Nguyen ; Toda, Masaya; Hokama, Takumi その他.
2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017. Institute of Electrical and Electronics Engineers Inc., 2017. p. 1232-1235 7863639 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS); Vol. 0).

研究成果: Conference contribution

Van Toan, N , Toda, M, Hokama, T & Ono, T 2017, Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. in 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017., 7863639, Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), vol. 0, Institute of Electrical and Electronics Engineers Inc., pp. 1232-1235, 30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017, Las Vegas, United States, 17/1/22. https://doi.org/10.1109/MEMSYS.2017.7863639

Van Toan N , Toda M, Hokama T, Ono T. Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. In 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017. Institute of Electrical and Electronics Engineers Inc. 2017. p. 1232-1235. 7863639. (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)). doi: 10.1109/MEMSYS.2017.7863639

Van Toan, Nguyen ; Toda, Masaya ; Hokama, Takumi その他. / Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing. 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017. Institute of Electrical and Electronics Engineers Inc., 2017. pp. 1232-1235 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)).

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abstract = "Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.",

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AB - Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.

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Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing

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