Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

Yoshiaki Kanamori, Junya Sato, Takeshi Shimano, Shigeo Nakamura, Kazuhiro Hane

研究成果: ジャーナルへの寄稿学術論文査読

10 被引用数 (Scopus)

抄録

Micro-fabrication combining stereo-lithography with reactive ion etching is proposed. Three-dimensional polymer structures smaller than 1 mm are fabricated on silicon wafer by He-Cd (325.0 nm) laser stereo-lithography. Using the polymer structure having a high-aspect ratio as resist for deep reactive ion etching, the microstructure is transferred to the silicon substrate with an etching ratio of 0.5. The proposed technique has been demonstrated by the fabrication of lens-like structures.

本文言語英語
ページ(範囲)1411-1416
ページ数6
ジャーナルMicrosystem Technologies
13
8-10
DOI
出版ステータス出版済み - 2007 5月

フィンガープリント

「Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル