抄録
A large-area rectangular modified-magnetron-type (MMT) radio frequency (RF) plasma source is newly developed and the properties are investigated in detail for producing a large-area uniform plasma. A quite uniform plasma with density variation less than several percent is produced in front of the rectangular substrate of 830×650 mm2. The spatial plasma uniformity is controlled not only by employing an upper auxiliary electrode but also by putting permanent magnets on the auxiliary electrode in several patterns. We now produce more uniform plasma by using auxiliary permanent magnets put on the upper auxiliary lid electrode.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 192-197 |
| ページ数 | 6 |
| ジャーナル | Thin Solid Films |
| 巻 | 407 |
| 号 | 1-2 |
| DOI | |
| 出版ステータス | Published - 2002 3月 22 |
| イベント | Proceedinggs of the 14th Symposium on Plasma Science for Marteri (SPSM-14) - Tokyo, Japan 継続期間: 2001 6月 13 → 2001 6月 14 |
ASJC Scopus subject areas
- 表面、皮膜および薄膜
- 凝縮系物理学
- 表面および界面