Silicon Contamination Adsorbed on Pure Titanium Plate during Soaking Test in Hanks' Balanced Saline Solution

Naofumi Ohtsu, Tetsuya Ashino, Katsuhiko Asami

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Silicon contamination adsorbed on pure Titanium plate during soaking test in Hanks' balanced saline solution (HBSS) and distilled water was investigated. Amounts of silicon eluted from various materials of vessels were determined by inductively coupled plasma atomic emission spectrometry (ICP-AES). The amounts of silicon deposited on the surface of pure titanium plates after soaking were evaluated by XPS. The amounts of eluted silicon in the solutions were dependent on the materials of vessels and pH value of solutions. The surface concentration of silicon on titanium plates reflected the amounts of eluted silicon in solutions. It is possible to reduce the silicon contamination by choosing suitable vessels as containers for solutions. However, in spite of using a vessel with no silicon elution, surface concentration of silicon on titanium plates was detected because of the silicon impurity of solution itself.

本文言語English
ページ(範囲)550-553
ページ数4
ジャーナルMaterials Transactions
45
2
DOI
出版ステータスPublished - 2004 2月

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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