TY - GEN
T1 - Smoothing sidewalls of a MEMS-based silicon X-ray optics
AU - Moriyama, Teppei
AU - Ezoe, Yuichiro
AU - Ogawa, Tomohiro
AU - Ohashi, Takaya
AU - Mitsuishi, Ikuyuki
AU - Mita, Makoto
AU - Mitsuda, Kazuhisa
AU - Kanamori, Yoshiaki
AU - Maeda, Akio
PY - 2011/12/12
Y1 - 2011/12/12
N2 - X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.
AB - X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.
KW - DRIE
KW - X-ray
KW - optics
KW - space mission
UR - http://www.scopus.com/inward/record.url?scp=82955193750&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=82955193750&partnerID=8YFLogxK
U2 - 10.1109/OMEMS.2011.6031043
DO - 10.1109/OMEMS.2011.6031043
M3 - Conference contribution
AN - SCOPUS:82955193750
SN - 9781457703362
T3 - International Conference on Optical MEMS and Nanophotonics
SP - 205
EP - 206
BT - Proceedings - OMN2011
T2 - 16th International Conference on Optical MEMS and Nanophotonics, OMN2011
Y2 - 8 August 2011 through 11 August 2011
ER -