Soft Magnetic Properties and Microstructure of Co-Ta-N Films

T. Shimatsu, W. Kimura, K. Satoh, H. Shoji, M. Takahashi, T. Wakiyama

研究成果: Article査読

抄録

Co-(0 to 15 at%)Ta-N sputtered films were studied in order to clarify the correlation between the structure, induced magnetic anisotropy, local anisotropy fluctuation, and soft magnetic properties. The results for electrical resistivity and film magnetostriction indicate that the temperature Txl at which Co crystallites are formed from an amorphous structure is lower than the temperature at which crystallites of Ta-nitrides are formed. The difference was 150°C for Co-15 at% Ta-N films. A large uniaxial magnetic anisotropy was induced at Txl by annealing in a magnetic field, and even after crystallization, a uniaxial anisotropy of magnitude 2xl03 erg/cc could be reversibly induced by annealing in a magnetic field.

本文言語English
ページ(範囲)927-933
ページ数7
ジャーナルIEEE Translation Journal on Magnetics in Japan
8
12
DOI
出版ステータスPublished - 1993 12月

ASJC Scopus subject areas

  • 工学(その他)
  • 工学(全般)

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