Surface chirality in rotational magnetoelectrodeposition of copper films

Iwao Mogi, Ryoichi Morimoto, Ryoichi Aogaki, Kohki Takahashi

研究成果: ジャーナルへの寄稿学術論文査読

9 被引用数 (Scopus)

抄録

Chiral surface formation was investigated in rotational magnetoelectrodeposition (RMED) of copper films, where an electrochemical cell was rotated in magnetic fields. The RMED was conducted with clockwise or anticlockwise rotation in the magnetic fields parallel or antiparallel to the ionic currents. The rotational frequencies were 0.5–6 Hz, and the magnetic fields were 2–5 T. The chiral behaviors are divided into four types: type I has chirality depending on the magnetic field polarity, type II has chirality depending on the rotational direction, and type III has chirality depending on both directions. Type IV represents chiral symmetry breaking, where the RMED films exhibit only L activity in any magnetic field polarity and rotational direction.

本文言語英語
論文番号53
ジャーナルMagnetochemistry
5
3
DOI
出版ステータス出版済み - 2019 9月

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