TY - GEN
T1 - Technical development of profile measurement for the soft X-ray via compton backward scattering
AU - Saito, T.
AU - Oshima, D.
AU - Ueyama, K.
AU - Hidume, S.
AU - Minamiguchi, Y.
AU - Hama, M.
AU - Washio,
AU - Kuroda, R.
AU - Kashiwagi, S.
AU - Urakawa, J.
AU - Hayano, H.
PY - 2005
Y1 - 2005
N2 - A compact X-ray source is required by such various fields as material development, biological science, and medical treatment. At Waseda University, we have succeeded to generate the soft X-ray of the wavelength within so-called water window region (250-500eV) via Compton backward scattering [1, 2] between 1047nm Nd:YLF laser and 4.6MeV high quality electron beam. Although this method equips some useful characters, e.g. high intensity, short pulse, energy variableness, etc, the X-ray generating system is compact enough to fit in tabletop size. In the next step, there rises two principal tasks; To make the soft X-ray intensity higher, 2-pass amplifier was utilized. To progress X-ray profile measurement techniques as preliminary experiments for biomicroscopy, we planned to irradiate X-ray to a resist film which is previously exposed by UV-lamp or get images with X-ray CCD. In this conference, we will show the experimental results and some future plans.
AB - A compact X-ray source is required by such various fields as material development, biological science, and medical treatment. At Waseda University, we have succeeded to generate the soft X-ray of the wavelength within so-called water window region (250-500eV) via Compton backward scattering [1, 2] between 1047nm Nd:YLF laser and 4.6MeV high quality electron beam. Although this method equips some useful characters, e.g. high intensity, short pulse, energy variableness, etc, the X-ray generating system is compact enough to fit in tabletop size. In the next step, there rises two principal tasks; To make the soft X-ray intensity higher, 2-pass amplifier was utilized. To progress X-ray profile measurement techniques as preliminary experiments for biomicroscopy, we planned to irradiate X-ray to a resist film which is previously exposed by UV-lamp or get images with X-ray CCD. In this conference, we will show the experimental results and some future plans.
UR - http://www.scopus.com/inward/record.url?scp=33847165692&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33847165692&partnerID=8YFLogxK
U2 - 10.1109/PAC.2005.1590727
DO - 10.1109/PAC.2005.1590727
M3 - Conference contribution
AN - SCOPUS:33847165692
SN - 0780388593
SN - 9780780388598
T3 - Proceedings of the IEEE Particle Accelerator Conference
SP - 1260
EP - 1262
BT - Proceedings of the Particle Accelerator Conference, PAC 2005
T2 - Particle Accelerator Conference, PAC 2005
Y2 - 16 May 2005 through 20 May 2005
ER -