Unintentional doping effects on atomically-thin Nb-doped M0S2 observed by scanning nonlinear dielectric microscopy

Kohci Yamasue, Yasuo Cho

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

Two-dimensional semiconductors such as atomically-thin M0S2 have recently gained much attention because of their superior material properties fascinating for the future electronic device applications. Here we investigate the nanoscale dominant carrier distribution on atomically-thin natural and Nb- doped M0S2 mechanically exfoliated on SiCVSi substrates by using scanning nonlinear dielectric microscopy. We show that a few-layer natural M0S2 sample is an 11-type semiconductor, as expected, but Nb-doped MoSj, normally considered as a p-type semiconductor, can unexpectedly become an n-typc semiconductor due to strong unintentional electron doping.

本文言語English
ホスト出版物のタイトルISTFA 2019 - Conference Proceedings from the 45th International Symposium for Testing and Failure Analysis
出版社ASM International
ページ498-503
ページ数6
ISBN(電子版)9781627082730
出版ステータスPublished - 2019
イベント45th International Symposium for Testing and Failure Analysis, ISTFA 2019 - Portland, United States
継続期間: 2019 11月 102019 11月 14

出版物シリーズ

名前Conference Proceedings from the International Symposium for Testing and Failure Analysis

Conference

Conference45th International Symposium for Testing and Failure Analysis, ISTFA 2019
国/地域United States
CityPortland
Period19/11/1019/11/14

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 制御およびシステム工学
  • 安全性、リスク、信頼性、品質管理

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